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Concept illustration of a schematic design fo <a href=https://www.adidas-yeezys.es>chanclas yeezy</a> r a glasses-mounted holographic retinal prosthesis. Credit: Roman Kanevsky, Inna Gefen amp Shy ShohamA team of researchers from the Technion-Israel Institute of Technology is combining c <a href=https://www.adidas-yeezy.it>yeezy</a> omputer-generated holography and optogenetics in an effort to develop a new strategy for restoring vision.Computer-generated holography, they say, could be used in conjunction with a technique called optogenetics, which uses gene therapy to deliver light-sensitive proteins to damaged retinal nerve cells. In conditions such as Retinitis Pigmentosa (RP) mdash a condition affecting about one in 4000 people in the United States mdash these light-sensing cells degenerate and lead to blindness. ldquo The basic idea of <a href=https://www.adidas-samba-adidas.it>adidas samba</a> optogenetics is to take a light-sensitive protein from another organism, typically from algae or bacteria, and insert it into a target cell, and that photosensitizes the cell, rdquo Shoham explained. Intense pulses of light can activate nerve Ekja OCZ Technology Unveils Indilinx Everest Series Solid State Drive Controller
Samsung ready to mass-produce EUV-based DRAM in 2021Samsung just announced that it has successfully shipped a million of its 10nm-class (D1x) DDR4 (Double Date Rate 4) DRAM modules based on extreme ultraviolet lithography (EUV) technology for customer evaluations.This news is significant because this is the first time EUV has been applied on DRAM. The milestone also means that Samsung is on track to deploy EUV for its D1a-based DDR5/LPDDR5 m <a href=https://www.yeezy.com.mx>yeezy 350</a> emory, which is now expected to go into mass production sometime next year.For some background, Samsung has been experimenting with EUV for its chips for at least three years now. Long story short, semiconductor manufacturers have long expected ArF (argon <a href=https://www.airmaxplus.de>nike air max97</a> fluoride) excimer laser tech, which is currently used to create circuitry patterns on wafers, to be unable to keep on creating finer and <a href=https://www.stanley-cup.com.de>stanley</a> finer circuits. Because of its shorter wavelength, the new EUV process will overcome this problem and allow denser patterns to be made. Why we do care Basically:

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